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Influence of base additives on the reaction-diffusion front of model chemically amplified photoresists
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10.1116/1.2429675
/content/avs/journal/jvstb/25/1/10.1116/1.2429675
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/25/1/10.1116/1.2429675

Figures

Image of FIG. 1.
FIG. 1.

(a) NR profiles with processing for bilayer containing base in MAdMA without PEB and after PEB at . The solid lines correspond to the fits of the data as shown in (b).

Image of FIG. 2.
FIG. 2.

Deprotection profiles with different base concentrations (●) 0%, (∎) 0.1%, (▴) 0.2%, and (▾) 0.3% by mass with TOA uniformly distributed in the bilayer with PEB at for (a) and (b) . The vertical dashed lines indicate the thickness to which the film dissolves when developed for in TMAH.

Image of FIG. 3.
FIG. 3.

Deprotection profile with different base concentrations (●) 0%, (∎) 0.1%, (▴) 0.2%, and (▾) 0.3% by mass with TOA only in the PMAdMA layer with PEB at for (a) and (b) .

Image of FIG. 4.
FIG. 4.

Deprotection profile with different base concentrations (●) 0%, (∎) 0.45%, and (▴) 1%, by mass with TOA only in the acid feeder layer with PEB at for .

Image of FIG. 5.
FIG. 5.

rms roughness of developed bilayers as determined by SPM for different base locations: (●) no base, (∎) coupled acid-base, (▴) uniform base, (엯) model photobase. As the latent-image slope increases, there is an improvement in the rms roughness to a finite limit of approximately .

Image of Scheme 1.
Scheme 1.

Acid catalyzed thermally activated deprotection of PMAdMA. In the presence of the photoacid, the MAdMA is deprotected to methacrylic acid and methylene adamantane.

Image of Scheme 2.
Scheme 2.

Depiction of the three different base distributions examined.

Tables

Generic image for table
TABLE I.

Surface roughness obtained from SPM for developed bilayers (for PEB).

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/content/avs/journal/jvstb/25/1/10.1116/1.2429675
2007-01-11
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of base additives on the reaction-diffusion front of model chemically amplified photoresists
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/25/1/10.1116/1.2429675
10.1116/1.2429675
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