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(a) Schematic drawing of device structure. (b) Optical photograph of the grown material (top view).
Scanning electron microscopy (SEM) graphs of (a) beam structure and (b) microdisk after patterning by reactive ion etching.
Schematic drawings of the electrodes distribution relative to the (a) beam structure and (b) microdisk.
Experimental setup of electrochemical etching. He gas was bubbled during the process.
SEM graphs of beam structure that are (a) underetched, (b) properly etched, and (c) overetched, and of microdisk structures which are etched by biasing: (d) one set of electrodes and (e) both sets of electrodes. Regions in (a) are labelled to correspond to Fig. 3.
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