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Poly- gate stack etching in high-density plasmas
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10.1116/1.2732736
/content/avs/journal/jvstb/25/3/10.1116/1.2732736
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/25/3/10.1116/1.2732736
/content/avs/journal/jvstb/25/3/10.1116/1.2732736
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/content/avs/journal/jvstb/25/3/10.1116/1.2732736
2007-04-27
2014-09-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Poly-Si∕TiN∕HfO2 gate stack etching in high-density plasmas
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/25/3/10.1116/1.2732736
10.1116/1.2732736
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