Direct-write trilayer technology for superconductor-insulator-normal metal tunnel junction fabrication
Comparison between the two versions of the fabrication procedure: Technology 1 (column to the left); Technology 2 (column to the right).
AFM images of the tunnel junctions manufactured in Technology 1.
Optical image of four tunnel junctions fabricated in Technology 2.
curves and at , Technology 1. Dynamic resistance around zero voltage is inserted in the middle; arrow to the right.
curves and at , Technology 2.
Voltage vs temperature dependence of a single tunnel junction. The chosen biasing current corresponds to maximum .
Article metrics loading...
Full text loading...