Evaluation of conductors for plasmonic imaging lithography. The metal with the highest material quality factor, silver, has a peak at , corresponding to optimal exposure wavelengths of .
Optical micrograph of the patterning step as the resist is exposed.
(a) AFM image of the sample postdevelopment. The patterns were exposed at scan speeds of 4, 8, and . The patterns become less defined as the dose is decreased from left to right, indicating a lower degree of cross-linking in the respective regions. (b) Three-dimensional AFM image of the well-defined line patterned at with cross-sectional analysis. The line has a FWHM of and a height of
Preparation of polymer 2, poly(4-methacrylmethyl styrene).
Mechanism of photoinduced cross-linking of the resist system. Excitation of camphorquinone at followed by hydrogen abstraction from dimethylaniline initiates polymerization of poly(4-methacrylmethyl styrene) in the film, forming insoluble material in the exposed region.
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