1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Extreme ultraviolet lithography: A review
Rent:
Rent this article for
USD
10.1116/1.2794048
/content/avs/journal/jvstb/25/6/10.1116/1.2794048
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/25/6/10.1116/1.2794048

Figures

Image of FIG. 1.
FIG. 1.

Classification of EUVL-related publications.

Image of FIG. 2.
FIG. 2.

Cross-sectional view of the ETS tool, its major components, and the EUV beam path.

Image of FIG. 3.
FIG. 3.

ETS 28° arc illuminator (left) and mask coverage of the full-field in step-and-scan mode (the full field is extendable to in the scanned dimension).

Image of FIG. 4.
FIG. 4.

Comparison of Xe and Sn EUV emission spectra from discharge-produced plasma generated under identical excitation conditions.

Image of FIG. 5.
FIG. 5.

Schematics of a discharge-produced plasma EUV source.

Image of FIG. 6.
FIG. 6.

Schematics for EUV collect optics of discharge produced plasma (left) and laser-produced plasma sources (right).

Image of FIG. 7.
FIG. 7.

Schematic of the ETS EUV lithographic camera.

Image of FIG. 8.
FIG. 8.

Top-review resist pattern.

Image of FIG. 9.
FIG. 9.

Cross-sectional image of an EUV mask using absorber.

Tables

Generic image for table
TABLE I.

Target technology node and potential extendability of NA and values (Ref. 45).

Generic image for table
TABLE II.

Top three challenges in EUVL implementation.

Generic image for table
TABLE III.

2006 AD specifications.

Generic image for table
TABLE IV.

Nominal specifications for EUVL projection optics (six-mirror system).

Generic image for table
TABLE V.

Atom absorbance.

Generic image for table
TABLE VI.

Intel EUVL resist requirement for 32 and technology nodes (Ref. 189).

Loading

Article metrics loading...

/content/avs/journal/jvstb/25/6/10.1116/1.2794048
2007-10-11
2014-04-21
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Extreme ultraviolet lithography: A review
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/25/6/10.1116/1.2794048
10.1116/1.2794048
SEARCH_EXPAND_ITEM