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Pixelated chemically amplified resists: Investigation of material structure on the spatial distribution of photoacids and line edge roughness
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10.1116/1.2800330
/content/avs/journal/jvstb/25/6/10.1116/1.2800330
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/25/6/10.1116/1.2800330
/content/avs/journal/jvstb/25/6/10.1116/1.2800330
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/content/avs/journal/jvstb/25/6/10.1116/1.2800330
2007-12-11
2014-07-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Pixelated chemically amplified resists: Investigation of material structure on the spatial distribution of photoacids and line edge roughness
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/25/6/10.1116/1.2800330
10.1116/1.2800330
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