Micro-nano mixture patterning by thermal-UV novel nanoimprinta)
Fabrication of the conventional micro-nano mixed structure by NIL. (a) Electron beam lithography and shallow dry etching for nanostructures. (b) Photolithography and deep reactive ion etching for microstructures. (c) Nanoimprint using micro-nano mixed mold.
Schematic diagram of the fabrication process of the micro-nano mixed structure by combination of the thermal and UV NIL. (a) Thick negative resist coating and mold preparation. (b) Nanopattern fabrication by thermal nanoimprint. (c) UV exposure for micropattern. (d) Demolding. (e) Resist development for micropatterns.
Mechanical property of the SU-8 resist.
Thermal nanoimprint for SU-8 in various temperatures under pressure. (a) , (b) , and (c) .
Process flow of the thermal and UV hybrid nanoimprint.
Experimental results of the thermal and UV hybrid NIL. (a) Nanoholes on the micrograting. (b) Nanodots on the micrograting.
Advanced process for replication of micro and nano mixture structure. (a) First Ni replication from the resist master structure fabricated the hybrid NIL. (b) Second Ni replication from the firstly replicated Ni. (c) Pressing of the Ni mold to polymer. (d) Release of the Ni mold and transfer of the micro-nano mixed structure.
Fabrication of reversed structure of the micro-nano mixed structure. (a) Replicated Ni mold having nanoholes on micromesa pattern. (b) Imprinted polymer structure having nanocorns on the bottom of microdeep well.
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