Structures and compositions of polymer-bound PAG and blended-PAG resists.
(a) Contrast curves and (b) the corresponding acid concentrations for the polymer-bound PAG and blended-PAG resists using DUV exposure.
SEM images of patterned resist films: minimum isolated space pattern achieved on (A) GE blend F4-IBBS.TPS and (B) GE-F4-MBS.TPS, and minimum 1:1 line-space patterns achieved on (C) GE blend F4-IBBS.TPS and (D)GE-F4-MBS.TPS.
Power spectrum of the minimum half-pitch patterns of GE-F4-MBS.TPS and GE blend F4-IBBS.TPS .
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