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Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching
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10.1116/1.2801884
/content/avs/journal/jvstb/25/6/10.1116/1.2801884
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/25/6/10.1116/1.2801884
/content/avs/journal/jvstb/25/6/10.1116/1.2801884
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/content/avs/journal/jvstb/25/6/10.1116/1.2801884
2007-12-06
2014-07-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/25/6/10.1116/1.2801884
10.1116/1.2801884
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