(a) Cross-section and (b) top-down views of the plasmonic lens design (drawings are not to scale).
Simulations of the (a) optical field exiting a plasmonic lens and (b) light field on the exit plane of this PL. The PL has one ring, , . (c) Comparison of the PSF at different planes, (dashed line), (dotted line), and (solid line).
SEM image of the PL used for the exposure experiment, consisting of four rings in a 100-nm-thick Ti film, the ring width , and the inner radius of the first ring .
Experiment apparatus to record the optical field emanating from a plasmonic lens. A gap of several micrometers is maintained between the PL and resist.
(a) AFM and (b) section analysis of the developed spots in the resist, , with dose. (c) AFM and (d) section analysis of spots exposed with dose, . The pitch was 500 nm.
SEM of the developed spots, diameter 300 nm, and pitch 400 nm.
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