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Subwavelength proximity nanolithography using a plasmonic lens
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View: Figures


Image of FIG. 1.
FIG. 1.

(a) Cross-section and (b) top-down views of the plasmonic lens design (drawings are not to scale).

Image of FIG. 2.
FIG. 2.

Simulations of the (a) optical field exiting a plasmonic lens and (b) light field on the exit plane of this PL. The PL has one ring, , . (c) Comparison of the PSF at different planes, (dashed line), (dotted line), and (solid line).

Image of FIG. 3.
FIG. 3.

SEM image of the PL used for the exposure experiment, consisting of four rings in a 100-nm-thick Ti film, the ring width , and the inner radius of the first ring .

Image of FIG. 4.
FIG. 4.

Experiment apparatus to record the optical field emanating from a plasmonic lens. A gap of several micrometers is maintained between the PL and resist.

Image of FIG. 5.
FIG. 5.

(a) AFM and (b) section analysis of the developed spots in the resist, , with dose. (c) AFM and (d) section analysis of spots exposed with dose, . The pitch was 500 nm.

Image of FIG. 6.
FIG. 6.

SEM of the developed spots, diameter 300 nm, and pitch 400 nm.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Subwavelength proximity nanolithography using a plasmonic lens