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Patterning issues in superconducting nanowire single photon detector fabrication
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10.1116/1.2806965
/content/avs/journal/jvstb/25/6/10.1116/1.2806965
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/25/6/10.1116/1.2806965

Figures

Image of FIG. 1.
FIG. 1.

NEB22A2 CD SEM variation according to the stack differences for the same exposure doses, i.e., . (a) Right CD, patterned on stack 2 (PL1). (b) Under exposed pattern on stack 3 showing a linewidth of instead of expected.

Image of FIG. 2.
FIG. 2.

Radial energy distribution at the resist/material interface at short range. Dotted lines shows RED for stack 1 (, rhombus) and stack 2 (PL1, square), and very similar and a continuous line for stack 3 (, triangle) with a RED twice less.

Image of FIG. 3.
FIG. 3.

AFM images of SSPDs prepared from (a) NbN-a layer, after a moderate stripping (vertical full scale ), (b) NbN-a, using the passivating layer PL2 on top, and after an O2 stripping as in Table I (vertical full scale ).

Image of FIG. 4.
FIG. 4.

Critical current of SSPDs at , patterned as described in text from the NbN-a sample, as a function of the meander width. The straight line corresponds to a critical current density of . Insert: typical curve obtained for meander width.

Tables

Generic image for table
TABLE I.

Summary of stripping experiments conditions and results. RIEs in various plasma atmospheres have been conducted sometimes followed by a wet clean of the sample. is the initial (final) resistance of samples at , and is their normal-superconductive transition temperature after treatment. NbN layer-B samples are size, cut from the same wafer.

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/content/avs/journal/jvstb/25/6/10.1116/1.2806965
2007-12-06
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Patterning issues in superconducting nanowire single photon detector fabrication
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/25/6/10.1116/1.2806965
10.1116/1.2806965
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