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He implantation to control B diffusion in crystalline and preamorphized Si
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10.1116/1.2816927
/content/avs/journal/jvstb/26/1/10.1116/1.2816927
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/1/10.1116/1.2816927
/content/avs/journal/jvstb/26/1/10.1116/1.2816927
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/content/avs/journal/jvstb/26/1/10.1116/1.2816927
2008-01-31
2014-09-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: He implantation to control B diffusion in crystalline and preamorphized Si
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/1/10.1116/1.2816927
10.1116/1.2816927
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