No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
Studies of fluorocarbon film deposition and its correlation with etched trench sidewall angle by employing a gap structure using and based capacitively coupled plasmas
Data & Media loading...
Article metrics loading...
Full text loading...