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Photoresist characterization using double exposures with interference lithography
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10.1116/1.2825169
/content/avs/journal/jvstb/26/1/10.1116/1.2825169
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/1/10.1116/1.2825169
/content/avs/journal/jvstb/26/1/10.1116/1.2825169
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/content/avs/journal/jvstb/26/1/10.1116/1.2825169
2008-01-04
2014-09-30
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Scitation: Photoresist characterization using double exposures with interference lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/1/10.1116/1.2825169
10.1116/1.2825169
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