Contact angle measurements of OTS (circles) and MPTS (squares) treated native Si oxide substrate as a function of immersing time. The concentration of SAM solution was solution for each case.
SEM images of PS nanotemplate fabricated with different immersion times: (a) 24 h and (b) 48 h. The substrate is Si with native oxide.
SEM images of PS nanotemplate fabricated with PS--PMMA film thicknesses (a) 22 nm, (b) 35 nm, and (c) 45 nm. (d) shows the film thickness measured by ellipsometer as a function of spin speed. The substrate is Si with native oxide.
SEM images and hole size distribution for PS--PMMA with molecular weights (a) and (b) . The substrate is Si with native oxide.
SEM images of PS nanotemplate formed on (a) poly-Si, (b) PE-CVD , and (c) ALD .
(a) Etching selectivity between thermal and PS blank films as a function of total working pressure showing the highest selectivity 1.7. (b) SEM image and (c) XPS Si spectrum of nanoporous sample.
(a) SEM image of Au nanodot array on Si substrate and (b) high resolution TEM image of a gold nanodot.
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