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Route to production of suspended perforated membranes
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10.1116/1.2889431
/content/avs/journal/jvstb/26/2/10.1116/1.2889431
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/2/10.1116/1.2889431
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) SEM image of holes formed in negative photoresist using interferometric lithography. (b) Flow demonstrating large scale patterning of IL patterned resist in a mix-and-match exposure.

Image of FIG. 2.
FIG. 2.

SEM images of representative silicon pillar matrices demonstrating the range of available aspect ratios.

Image of FIG. 3.
FIG. 3.

Examples of silicon pillar matrix before and after stripping the ARC/chrome cap.

Image of FIG. 4.
FIG. 4.

Sequence of interstitial fill and etch back. (a) represents the overfilled pillar matrix, while (b), (c), and (d) represent 35, 40, and etches in 20:1 BOE.

Image of FIG. 5.
FIG. 5.

SEM images of examples of three different suspended perforated films: (a) siloxane spin on glass film, (b) SU-8 film, and (c) evaporated chromium film.

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/content/avs/journal/jvstb/26/2/10.1116/1.2889431
2008-03-28
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Route to production of suspended perforated membranes
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/2/10.1116/1.2889431
10.1116/1.2889431
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