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Ion beam machining of Si layer deposited on Zerodur® substrate
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10.1116/1.2907779
/content/avs/journal/jvstb/26/3/10.1116/1.2907779
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/3/10.1116/1.2907779
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Atomic force microscopy (AFM) images of (a) Zerodur® substrate before ion beam sputtering (IBS) deposition and (b) Si deposited on Zerodur® substrate by IBS.

Image of FIG. 2.
FIG. 2.

(a-1) Image of the shape of the machined surface without an electron beam neutralizer and (a-2) profile of the surface. (b-1) The Si surface machined after grounding it and (b-2) profile of the surface.

Image of FIG. 3.
FIG. 3.

(a) Mid-spatial-frequency roughness (MSFR) of the unprocessed surface of Si deposited on Zerodur® measured by a scanning white-light interferometer. (b) Surface machined up to a depth of using an ion beam having an energy of .

Image of FIG. 4.
FIG. 4.

MSFR of Si deposited on Zerodur® substrates as a function of the ion-beam-machined depth.

Image of FIG. 5.
FIG. 5.

(a) AFM image of the unprocessed surface. AFM image of the surface machined by ion beams having energies of (b) , (c) , (d) , and (e) . Each surface was machined up to a depth of .

Image of FIG. 6.
FIG. 6.

High-spatial-frequency roughness (HSFR) as a function of the machined depth for each energy level.

Image of FIG. 7.
FIG. 7.

Average HSFR of the surface machined up to as a function of the energy of the ion beam.

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/content/avs/journal/jvstb/26/3/10.1116/1.2907779
2008-04-22
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ion beam machining of Si layer deposited on Zerodur® substrate
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/3/10.1116/1.2907779
10.1116/1.2907779
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