Ion beam machining of Si layer deposited on Zerodur® substrate
Atomic force microscopy (AFM) images of (a) Zerodur® substrate before ion beam sputtering (IBS) deposition and (b) Si deposited on Zerodur® substrate by IBS.
(a-1) Image of the shape of the machined surface without an electron beam neutralizer and (a-2) profile of the surface. (b-1) The Si surface machined after grounding it and (b-2) profile of the surface.
(a) Mid-spatial-frequency roughness (MSFR) of the unprocessed surface of Si deposited on Zerodur® measured by a scanning white-light interferometer. (b) Surface machined up to a depth of using an ion beam having an energy of .
MSFR of Si deposited on Zerodur® substrates as a function of the ion-beam-machined depth.
(a) AFM image of the unprocessed surface. AFM image of the surface machined by ion beams having energies of (b) , (c) , (d) , and (e) . Each surface was machined up to a depth of .
High-spatial-frequency roughness (HSFR) as a function of the machined depth for each energy level.
Average HSFR of the surface machined up to as a function of the energy of the ion beam.
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