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Metal-containing release layers for use with UV-cure nanoimprint lithographic template materials
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10.1116/1.2939258
/content/avs/journal/jvstb/26/4/10.1116/1.2939258
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/4/10.1116/1.2939258

Figures

Image of FIG. 1.
FIG. 1.

Schematic illustrating types of resist-related defects that can be found in UV-cure nanoimprint material systems. The chemical characteristics of the template release layer—cured resist system determine the likelihood that cured polymer will remain adhered to it after template removal.

Tables

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TABLE I.

Higher and lower values measured for selected resists with standard deviations ( ).

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TABLE II.

release surface compositions normalized to Ti and corresponding values for ( ), with standard deviations (for sputter deposited in a 4.5 SCCM flow).

Generic image for table
TABLE III.

Compositions of Al-containing release layers debonded from Si-containing resists, with standard deviations .

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/content/avs/journal/jvstb/26/4/10.1116/1.2939258
2008-08-12
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Metal-containing release layers for use with UV-cure nanoimprint lithographic template materials
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/4/10.1116/1.2939258
10.1116/1.2939258
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