Schematic illustrating types of resist-related defects that can be found in UV-cure nanoimprint material systems. The chemical characteristics of the template release layer—cured resist system determine the likelihood that cured polymer will remain adhered to it after template removal.
Higher and lower values measured for selected resists with standard deviations ( ).
release surface compositions normalized to Ti and corresponding values for ( ), with standard deviations (for sputter deposited in a 4.5 SCCM flow).
Compositions of Al-containing release layers debonded from Si-containing resists, with standard deviations .
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