(a) Standard peak positions of rutile, anatase, and Ge and XRD patterns from the samples obtained from target deposited at (b) , samples S1, S2, and S3; (c) , samples S4, S5, and S6; and (d) , samples S7, S8, and S9.
High-resolution XPS scan of Ge region for (a) pure germanium wafer, (b) samples deposited at , (c) samples deposited at , and (d) sample deposited at . peak positions of Ge, , and are 28.95, 32.5, and , respectively.
High-resolution XPS spectrum for the Ti region.
Plane view bright field image of Ge nanocrystals embedded in matrix in samples (a) S5 (, ) and (b) S9 (, ).
Log normal fit for the particle size distribution of sample S9 obtained using the bright field TEM image shown in Fig. 4(b).
Samples from target : : with deposition parameters specified.
Comparison of reference and calculated lattice parameters of rutile, anatase, and Ge.
Quantitative analyses of XRD results.
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