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Smooth sidewall in InP-based photonic crystal membrane etched by -based inductively coupled plasma
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10.1116/1.2945299
/content/avs/journal/jvstb/26/4/10.1116/1.2945299
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/4/10.1116/1.2945299
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

SEM cross-sectional views of (a) the mask just after the CCP-RIE etching and (b) PhC holes after the plasma etching in an ICP-RIE system. (c) Magnified view on the hole sidewalls.

Image of FIG. 2.
FIG. 2.

SEM cross-sectional views of PhC hole structures etched by plasmas with various ratios: (a) 14%, (b) 62%, and (c) 67%. The and mass flow rates are fixed at and .

Image of FIG. 3.
FIG. 3.

Etch rates for wide trenches (square) and diameter PhC holes (triangle) etched by plasmas with either (a) various ratios ( and ) or (b) various ratios ( and ).

Image of FIG. 4.
FIG. 4.

SEM cross-sectional views of PhC hole structures etched by plasmas with various ratios: (a) 0%, (b) 11%, and (c) 15%. The and mass flow rates are fixed at and .

Image of FIG. 5.
FIG. 5.

Evolution of the positive ion current density with (a) the ICP power (empty triangle; ) and the total gas pressure (filled square; ) in a plasma, (b) the ratio (filled circle; and ) and the ratio (empty square; , and ) in a plasma with and .

Image of FIG. 6.
FIG. 6.

SEM cross-sectional views of (a) a PhC hole structure and (b) an InP W1 PhC membrane waveguide after InGaAs selective wet etching. (c) Magnification on the InP membrane with PhC holes. The etching was performed in a plasma with , , and .

Image of FIG. 7.
FIG. 7.

TEM images of etched PhC holes in heterostructure by a ICP plasma: (a) enlarged view of the PhC holes, (b) magnification on the sidewalls and the interface, and (c) magnification on the InP sidewall.

Image of FIG. 8.
FIG. 8.

Time-resolved photoluminescence for InP PhC structures etched by either a or a plasma. The nonetched stack result is indicated for comparison (gray line).

Image of FIG. 9.
FIG. 9.

Spectrally resolved transmission of a long InP W1 PhC suspended membrane waveguide etched by an ICP plasma.

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/content/avs/journal/jvstb/26/4/10.1116/1.2945299
2008-08-12
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Smooth sidewall in InP-based photonic crystal membrane etched by N2-based inductively coupled plasma
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/4/10.1116/1.2945299
10.1116/1.2945299
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