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Si-containing block copolymers for self-assembled nanolithography
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View: Figures


Image of FIG. 1.
FIG. 1.

Self-assembled PS-PFS patterns. (a) In grooves of different widths, a composite image (from Ref. 17), (b) in a 60° angle (from Ref. 22), (c) in narrow grooves, showing ellipsoidal distortion of the PFS microdomains (from Ref. 34). In each case the PS matrix has been selectively etched.

Image of FIG. 2.
FIG. 2.

Plan and side views of a section of a period PDMS cylinder array ordered within a wide shallow silica groove (groove edges are not shown). The PS matrix and PDMS surface layer have been etched.

Image of FIG. 3.
FIG. 3.

(a) Plan view of period PDMS cylinders oriented perpendicular to the edges of the template (from Ref. 25). (b) period PDMS sphere array templated by a sparse array of HSQ pillars, some of which are circled (from Ref. 36). The PS matrix and PDMS surface layer have been etched.

Image of FIG. 4.
FIG. 4.

PDMS cylinders confined within circular pits curve to follow the pit edges. The number of concentric rings is governed by the template diameter. The central feature can be a PS dot (dark) or a PDMS dot (white, middle image). The PS matrix and PDMS surface layer have been removed. From Ref. 35.

Image of FIG. 5.
FIG. 5.

(a) Co dot array with period made by etching a Co film using PS-PFS as a mask. (b) Upper panel: PS-PFS self-assembled in a template made from ARC. Middle panel: pattern transferred into silica, after removal of the ARC. Lower panel: pattern transferred into W.

Image of FIG. 6.
FIG. 6.

(a) Array of Co rings. Each ring consists of two concentric rings, closely spaced. (From Ref. 35). (b) Array of period lines etched into a PEDOT thin film (Ref. 47).


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Si-containing block copolymers for self-assembled nanolithography