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Easy duplication of stamps using UV-cured fluoro-silsesquioxane for nanoimprint lithography
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10.1116/1.2987966
/content/avs/journal/jvstb/26/6/10.1116/1.2987966
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/6/10.1116/1.2987966
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Chemical structure of (a) resins and (b) fluoro-SSQ resin.

Image of FIG. 2.
FIG. 2.

Process flow to improve the adhesion between the PET substrate and the fluoro-SSQ material for the fluoro-SSQ stamp fabrication.

Image of FIG. 3.
FIG. 3.

SEM pictures of (a) 700 and (b) period patterns produced in fluoro-SSQ.

Image of FIG. 4.
FIG. 4.

SEM pictures of resist patterns imprinted by using the fluoro-SSQ based stamp. (a) pitch PDMS grating, (b) 700 and (c) pitch grating patterns in resin.

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/content/avs/journal/jvstb/26/6/10.1116/1.2987966
2008-12-01
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Easy duplication of stamps using UV-cured fluoro-silsesquioxane for nanoimprint lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/6/10.1116/1.2987966
10.1116/1.2987966
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