Easy duplication of stamps using UV-cured fluoro-silsesquioxane for nanoimprint lithography
Chemical structure of (a) resins and (b) fluoro-SSQ resin.
Process flow to improve the adhesion between the PET substrate and the fluoro-SSQ material for the fluoro-SSQ stamp fabrication.
SEM pictures of (a) 700 and (b) period patterns produced in fluoro-SSQ.
SEM pictures of resist patterns imprinted by using the fluoro-SSQ based stamp. (a) pitch PDMS grating, (b) 700 and (c) pitch grating patterns in resin.
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