Metal transfer assisted nanolithography on rigid and flexible substrates
Schematic of metal transfer assisted nanolithography.
Schematic of shadow evaporation of metals to reduce pattern linewidth. After the metal transfer to the PMMA layer, the pattern can be further transferred to the substrate as shown in Fig. 1. The resulting pattern linewidth is reduced by the thickness of the metal on the PDMS grating sidewall during shadow evaporation.
SEM images of the transferred metal grating onto PMMA layer with periods of (a) 700 nm on substrate and (b) 220 nm on PET substrate, (c) after RIE of (b), and (d) after metallization and lift-off process of (c).
SEM images of the sequentially transferred two metal gratings [(a)–(c)] and the corresponding nanosize metal particle arrays on PET substrate after metallization and lift-off process [(d)–(f)]. Two 220 nm period gratings were transferred orthogonally (a) and with an angle of (b). (c) A 700 nm pitch grating was transferred orthogonally to a 220 nm period grating. [(d)–(f)] Nanosize metal particle arrays with different shapes such as square (d), diamond (e), and nanobar (e) after metallization and lift-off process of (a)–(c).
Localized surface plasmon resonance spectra of nanosquare arrays obtained for linearly polarized incident light aligned along the shorter axis a (●) and longer axis b (◆).
SEM image of the metal grating on PET substrate after linewidth reduction. The inset shows is a zoom-in view showing that the linewidth was reduced to 50 nm.
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