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Stability of HSQ nanolines defined by e-beam lithography for Si nanowire field effect transistors
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10.1116/1.3002561
/content/avs/journal/jvstb/26/6/10.1116/1.3002561
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/6/10.1116/1.3002561
/content/avs/journal/jvstb/26/6/10.1116/1.3002561
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/content/avs/journal/jvstb/26/6/10.1116/1.3002561
2008-12-01
2014-11-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Stability of HSQ nanolines defined by e-beam lithography for Si nanowire field effect transistors
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/26/6/10.1116/1.3002561
10.1116/1.3002561
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