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Fabrication of metallic nanoslit waveguides with sharp bends
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View: Figures


Image of FIG. 1.
FIG. 1.

Layout of a prototypical metallic nanoslit waveguide used for process validity verification. The details of the waveguide sections with right-angle bends (zigzag or U-turn structures), which are part of the nanoslit but not displayed in the three-dimensional illustration, are shown in the inserts.

Image of FIG. 2.
FIG. 2.

Metallic nanoslit waveguide fabrication process (starting from step 3, only the objects inside the plating seed area are illustrated).

Image of FIG. 3.
FIG. 3.

Snapshots of the 100-nm-wide U-turn slit waveguide (100 nm spacing) patterns taken from JEOL e-beam lithography tool pattern check software, showing the actual pattern fracturing results for proximity effect correction. Each color in the pattern stands for a certain exposure dose rank, as labeled on the scale bar (dose rank number is not proportional to the actual dose). Left: U-turn pattern was fractured by the proximity effect correction software LAYOUT BEAMER from GenISys GmbH. Right: U-turn pattern was manually fractured for proximity effect correction.

Image of FIG. 4.
FIG. 4.

SEM micrographs of the HSQ core for a metallic nanoslit waveguide. Right: Low magnification image of the HSQ core of a waveguide section with multiple right-angle bends. Left: High magnification image of a section of HSQ core with the U-turn structure.

Image of FIG. 5.
FIG. 5.

Images for the sample before the electroplating process. Upper right: Photograph of a test wafer after removing the titanium adhesion promoter layer. The rainbow patterns are SU-8 strip waveguides. Left: SEM micrograph of three waveguides. Lower right: High magnification SEM micrograph of the joint part of HSQ nanoslit core, HSQ taper coupler core and SU-8 strip waveguide.

Image of FIG. 6.
FIG. 6.

SEM micrograph of a section of plated nanoslit waveguide with a U-turn structure.

Image of FIG. 7.
FIG. 7.

SEM micrograph of the cross section of a plated nanoslit waveguide at a U-turn section.

Image of FIG. 8.
FIG. 8.

FDTD-simulated guided mode at in a 100-nm-wide gold slit waveguide filled with a core. The color represents the intensity of the electromagnetic field. The profile of the waveguide cross-section structure is denoted with the black lines.


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Scitation: Fabrication of metallic nanoslit waveguides with sharp bends