1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Dependence of etch rates of silicon substrates on the use of and plasmas in the deposition step of the Bosch process
Rent:
Rent this article for
USD
10.1116/1.3039690
/content/avs/journal/jvstb/27/1/10.1116/1.3039690
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/1/10.1116/1.3039690
/content/avs/journal/jvstb/27/1/10.1116/1.3039690
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/avs/journal/jvstb/27/1/10.1116/1.3039690
2009-01-12
2014-07-29
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Dependence of etch rates of silicon substrates on the use of C4F8 and C4F6 plasmas in the deposition step of the Bosch process
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/1/10.1116/1.3039690
10.1116/1.3039690
SEARCH_EXPAND_ITEM