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REBL: A novel approach to high speed maskless electron beam direct write lithography
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10.1116/1.3054281
/content/avs/journal/jvstb/27/1/10.1116/1.3054281
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/1/10.1116/1.3054281
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Diagram of REBL nanowriter concept.

Image of FIG. 2.
FIG. 2.

(Color online) Ray diagram of the REBL reflective electron optics.

Image of FIG. 3.
FIG. 3.

(Color online) First REBL column on test stand for characterization.

Image of FIG. 4.
FIG. 4.

(Color online) Sequence of four time intervals in the TDI exposure method.

Image of FIG. 5.
FIG. 5.

(Color online) Layout of DPG pixel bit blocks used for gray tone dose control.

Image of FIG. 6.
FIG. 6.

(Color online) Graph showing isothroughput curves for a linear stage, plotting the stage turnaround acceleration vs the swath height. The REBL nanowriter region of interest for the swath height is also shown.

Image of FIG. 7.
FIG. 7.

(Color online) Concept design of a rotary stage using a six wafer batch.

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/content/avs/journal/jvstb/27/1/10.1116/1.3054281
2009-01-29
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: REBL: A novel approach to high speed maskless electron beam direct write lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/1/10.1116/1.3054281
10.1116/1.3054281
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