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Deep reactive ion etching as a tool for nanostructure fabrication
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10.1116/1.3065991
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    Affiliations:
    1 Department of Engineering, University of Cambridge, 9 J.J. Thomson Avenue, Cambridge CB3 0FA, United Kingdom and Department of Mechanical Engineering, School of Engineering and Physical Sciences, Heriot Watt University, Edinburgh EH14 4AS, United Kingdom
    2 Nokia Research Centre Cambridge, c/o Nanoscience Centre, Cambridge CB3 0FF, United Kingdom
    3 Department of Engineering, University of Cambridge, 9 J.J. Thomson Avenue, Cambridge CB3 0FA, United Kingdom
    4 Department of Engineering, University of Cambridge, 9 J.J. Thomson Avenue, Cambridge CB3 0FA, United Kingdom and Centre for Material Research and Innovation, University of Bolton, Deane Road, Bolton BL3 5AB, United Kingdom
    5 Department of Engineering, University of Cambridge, 9 J.J. Thomson Avenue, Cambridge CB3 0FA, United Kingdom
    a) Author to whom correspondence should be addressed; electronic mail: r.y.fu@hw.ac.uk
    J. Vac. Sci. Technol. B 27, 1520 (2009); http://dx.doi.org/10.1116/1.3065991
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/content/avs/journal/jvstb/27/3/10.1116/1.3065991
2009-05-27
2014-09-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Deep reactive ion etching as a tool for nanostructure fabrication
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/3/10.1116/1.3065991
10.1116/1.3065991
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