Fabrication of one-dimensional and two-dimensional periodically polarity inverted ZnO structures using the patterned CrN buffer layers
Schematic picture of the fabrication procedure for the periodically polarity inverted ZnO structure. (a) LT ZnO growth on the Zn pre-exposed CrN buffer. (b) Stripe patterned ZnO by photolithography and etching. (c) ZnO regrowth with the Zn-polar on the CrN and O-polar ZnO on the , resulting in the fabrication of the PPI ZnO structure.
(a) Piezoresponse microscopy images of Zn- and O-polar regions in the 1D PPI ZnO structures and (b) corresponding cross-sectional piezoresponse volatge profile.
(Color online) (a) Optical microscope and (b) fluorescent microscope image of the PPI structure with periodicity which show the opposite contrast characteristics.
Schematic diagram of setup for diffraction measurement using the laser beam and obtained diffraction pattern from the fabricated 1D PPI ZnO structure with periodicity.
(a) Cross-sectional HRTEM micrograph of the PPI ZnO grown on and (b) substrate. DDPs for the ZnO, CrN, and were shown in the image, which were obtained by the FFT of the marked square regions on the image.
Cathodoluminescence spectra of PPI ZnO from the different polar region, i.e., the upper and lower spectrum were obtained from the Zn- and O-polar regions, respectively.
(Color online) (a) SEM image of 2D PPI ZnO grown on the patterned LT templates. (b) AFM topography of the fabricated periodical polarity controlled structure. (c) PRM image of the fabricated structure showing the polarity sensitive contrast, where brighter and darker regions correspond to O- and Zn-polars, respectively.
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