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Fabrication of crystalline Si spheres with atomic-scale surface smoothness using homogenized KrF excimer laser reformation system
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10.1116/1.3137963
/content/avs/journal/jvstb/27/3/10.1116/1.3137963
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/3/10.1116/1.3137963
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Diagram of the homogenized KrF excimer laser reformation system.

Image of FIG. 2.
FIG. 2.

Flowchart of the fabrication process.

Image of FIG. 3.
FIG. 3.

tilted SEM images of the samples after RIE etching. The diameters of the Si rods are (a) , (b) , (c) , (d) , (e) , (f) , (g) , and (h) .

Image of FIG. 4.
FIG. 4.

SEM images of Si structures after excimer laser reformation. (a)–(h) are corresponding structures to Fig. 3.

Image of FIG. 5.
FIG. 5.

, tilted SEM images in the spherical case: (a) before illumination and (b) after illumination.

Image of FIG. 6.
FIG. 6.

(a) AFM image of the fabricated Si sphere and (b) the cross section of the area near the top of the sphere [the cross section of the solid line in (a)].

Image of FIG. 7.
FIG. 7.

TEM image of the fabricated Si sphere. The insert figure is the TEM profile of the detected sphere.

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/content/avs/journal/jvstb/27/3/10.1116/1.3137963
2009-05-15
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of crystalline Si spheres with atomic-scale surface smoothness using homogenized KrF excimer laser reformation system
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/3/10.1116/1.3137963
10.1116/1.3137963
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