Steps involved in the SFIL process (liquid dispensing, imprinting, UV exposure, template release, and etching).
(a) Top view of the imprint system showing the template features landing directly over the liquid resist drops. (b) Side view of the imprint system showing the residual thickness and the drop radius. For clarity purpose, only one of the many dispensed liquid drops (not to scale) is shown the figure.
Schematic (not to scale) of gas entrapment in a pore of radius with liquid level . , , and represent the pressure, volume, and the surface concentration of an entrapped gas, respectively. represents the velocity of the liquid interface (filling rate) inside the pore.
Top view of a liquid drop (not to scale) with template features (array of pores) landing directly over it. The origin of radial coordinate is at the center of the drop as shown above.
Gas concentration profile across the liquid drop at 100% filling for a array of wide and deep pores.
Filling progression for arrays of pores of different sizes.
Effect of various parameters on the progression of feature filling: (a) viscosity, (b) diffusivity, (c) solubility, and (d) surface tension.
Filling time for arrays of pores of different sizes and depths.
Filling time for arrays of deep pores of different sizes at various pitches.
Numerical values of the parameters used in the feature filling model simulations
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