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Feature filling modeling for step and flash imprint lithography
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Image of FIG. 1.
FIG. 1.

Steps involved in the SFIL process (liquid dispensing, imprinting, UV exposure, template release, and etching).

Image of FIG. 2.
FIG. 2.

(a) Top view of the imprint system showing the template features landing directly over the liquid resist drops. (b) Side view of the imprint system showing the residual thickness and the drop radius. For clarity purpose, only one of the many dispensed liquid drops (not to scale) is shown the figure.

Image of FIG. 3.
FIG. 3.

Schematic (not to scale) of gas entrapment in a pore of radius with liquid level . , , and represent the pressure, volume, and the surface concentration of an entrapped gas, respectively. represents the velocity of the liquid interface (filling rate) inside the pore.

Image of FIG. 4.
FIG. 4.

Top view of a liquid drop (not to scale) with template features (array of pores) landing directly over it. The origin of radial coordinate is at the center of the drop as shown above.

Image of FIG. 5.
FIG. 5.

Gas concentration profile across the liquid drop at 100% filling for a array of wide and deep pores.

Image of FIG. 6.
FIG. 6.

Filling progression for arrays of pores of different sizes.

Image of FIG. 7.
FIG. 7.

Effect of various parameters on the progression of feature filling: (a) viscosity, (b) diffusivity, (c) solubility, and (d) surface tension.

Image of FIG. 8.
FIG. 8.

Filling time for arrays of pores of different sizes and depths.

Image of FIG. 9.
FIG. 9.

Filling time for arrays of deep pores of different sizes at various pitches.


Generic image for table

Numerical values of the parameters used in the feature filling model simulations


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Feature filling modeling for step and flash imprint lithography