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Dry etch selectivity of hardmasks for sub- patterning applications
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10.1116/1.3151836
/content/avs/journal/jvstb/27/4/10.1116/1.3151836
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/4/10.1116/1.3151836

Figures

Image of FIG. 1.
FIG. 1.

Correlation between density of film and etch selectivity to PE TEOS oxide.

Image of FIG. 2.
FIG. 2.

(a) FTIR spectra comparison of peaks for (HT) and (LT) samples. (b) FTIR spectra comparison of peaks for (HT) , (LT) , and (MT) samples.

Image of FIG. 3.
FIG. 3.

carbon contents and extinction coefficients of the samples.

Image of FIG. 4.
FIG. 4.

Summary of aggregate bond energy and etch selectivity of the samples.

Tables

Generic image for table
TABLE I.

Summary of material properties and etch selectivity to PE TEOS oxide.

Generic image for table
TABLE II.

Bond energy calculations for the different films.

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/content/avs/journal/jvstb/27/4/10.1116/1.3151836
2009-06-23
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Dry etch selectivity of a-C:H hardmasks for sub-65nm patterning applications
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/4/10.1116/1.3151836
10.1116/1.3151836
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