1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Lift-off process using bilayer ultraviolet nanoimprint lithography and methacryloxypropyl-terminated-polydimethylsiloxane-based imprint resin
Rent:
Rent this article for
USD
10.1116/1.3156739
/content/avs/journal/jvstb/27/4/10.1116/1.3156739
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/4/10.1116/1.3156739
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Overall process flow for fabrication of the metal pattern using bilayer UV-NIL and lift-off process.

Image of FIG. 2.
FIG. 2.

Photograph of the imprinted resist patterns on the PVA-coated Si substrate using M-PDMS-based UV-curable imprint resin (A) without and (B) with methacryl-oxypropyl-trichlorosilane as an adhesion promoter. [(1) imprinted pattern; (2) region where patterns were detached from the substrate]

Image of FIG. 3.
FIG. 3.

(A) Cross-sectional and (B) top-down SEM images of the quartz template, and (C) cross-sectional and (D) top-down SEM images of the imprinted resist pattern.

Image of FIG. 4.
FIG. 4.

Cross-sectional SEM images after RIE with rf power of (A) , (B) , and (C) and top-down SEM image after RIE with rf power of . (Etch time is fixed at , the symbol “I” in figures is the height of initial imprinted pattern.)

Image of FIG. 5.
FIG. 5.

(A) Top-down and (B) cross-sectional SEM images of Ti patterns after the lift-off process.

Loading

Article metrics loading...

/content/avs/journal/jvstb/27/4/10.1116/1.3156739
2009-06-24
2014-04-25
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Lift-off process using bilayer ultraviolet nanoimprint lithography and methacryloxypropyl-terminated-polydimethylsiloxane-based imprint resin
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/4/10.1116/1.3156739
10.1116/1.3156739
SEARCH_EXPAND_ITEM