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Fabrication of Si-based two-dimensional photonic quasicrystals by using multiple-exposure holographic lithography
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10.1116/1.3159782
/content/avs/journal/jvstb/27/4/10.1116/1.3159782
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/4/10.1116/1.3159782
/content/avs/journal/jvstb/27/4/10.1116/1.3159782
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/content/avs/journal/jvstb/27/4/10.1116/1.3159782
2009-06-29
2014-09-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of Si-based two-dimensional photonic quasicrystals by using multiple-exposure holographic lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/4/10.1116/1.3159782
10.1116/1.3159782
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