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Micropatterning of polymeric semiconductor by selective lift-off method using epoxy mold
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10.1116/1.3167372
/content/avs/journal/jvstb/27/4/10.1116/1.3167372
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/4/10.1116/1.3167372

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Schematic representation of the patterning process.

Image of FIG. 2.
FIG. 2.

(Color online) Optical microscopic images of (a) PEDOT: PSS and polarizing optical microscopic images of microstructures (b) P3HT and (c) MEH-PPV.

Image of FIG. 3.
FIG. 3.

(Color online) [(a) and (b)] AFM image of P3HT pattern being transfer printed to the Si substrate; (c) polarizing optical microscopic image of microholes of P3HT printed on MEH-PPV film (P3HT dark region; MEH-PPV red dot); (d) AFM cross-sectional profile of the patterned P3HT film from (a) and (b) on Si substrate (thickness of ).

Image of FIG. 4.
FIG. 4.

(Color online) Electrical characteristics of OTFTs. (a) Output and (b) transfer characteristic curves of the P3HT transistor whose active layer was patterned by selective lift off with epoxy mold. Inset: optical microscopic images of the P3HT transistor. The bright stripes with the dotted outlines marked S and D are the metallic top contacts. The dark line in bracket is the patterned P3HT line.

Tables

Generic image for table
TABLE I.

Surface energy of P3HT, MEH-PPV, PEDOT: PSS, PDMS, and epoxy.

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/content/avs/journal/jvstb/27/4/10.1116/1.3167372
2009-07-24
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Micropatterning of polymeric semiconductor by selective lift-off method using epoxy mold
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/4/10.1116/1.3167372
10.1116/1.3167372
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