Two-step EBL writing process for the formation of dot arrays.
(a) Transferring the pattern from the master mold onto the IPS through hot embossing and (b) process flow for fabrication of daughter mold.
(a) CAD images of DTR patterns drawn using the autogeneration program. (b) Optical image of a segment on the master mold showing two servo patterns and the tracks in between.
Comparison SEM images of 120 nm track pitch master mold (top row) and daughter mold (bottom row): (a) preamble, (b) servo coding area, (c) burst area, and (d) closeup of burst area.
100 nm track pitch master mold SEM images of (a) preamble and data tracks and (b) closeup of servo and data track transition.
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