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Direct indium tin oxide patterning using thermal nanoimprint lithography for highly efficient optoelectronic devices
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10.1116/1.3243170
/content/avs/journal/jvstb/27/6/10.1116/1.3243170
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3243170
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Schematic diagram of the procedure for ITO direct patterning using nanoimprint lithography with ITO NP solution. (b) Detailed imprinting process flow with ITO NP solution.

Image of FIG. 2.
FIG. 2.

Resistivity of the blanket ITO thin film, derived from ITO NP solution, as a function of the annealing temperature.

Image of FIG. 3.
FIG. 3.

Schematic diagram of (a) the conventional ITO glass and (b) the directly patterned ITO layer/ITO glass for enhancing the transmittance using periodic nanopatterns.

Image of FIG. 4.
FIG. 4.

(a) SEM and (b) AFM images of the directly patterned ITO layer on the substrate.

Image of FIG. 5.
FIG. 5.

Transmittance spectra of the ITO glass and ITO NP patterns on ITO glass, (a) Transmittance of pre- and postannealed ITO glass, (b) transmittance of pre- and postannealed ITO NP patterns on ITO glass, and (c) transmittance compared to the preannealed ITO glass and postannealed ITO NP patterns on the ITO glass.

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/content/avs/journal/jvstb/27/6/10.1116/1.3243170
2009-12-03
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Direct indium tin oxide patterning using thermal nanoimprint lithography for highly efficient optoelectronic devices
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3243170
10.1116/1.3243170
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