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Lithographically directed surface modification
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10.1116/1.3250200
/content/avs/journal/jvstb/27/6/10.1116/1.3250200
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3250200
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Figures

Image of FIG. 1.
FIG. 1.

(a) Polar surface energy vs exposure dose at 157 nm for -alkylsiloxane-modified silicon surfaces. (b) Polar surface energy vs exposure dose at 157 nm for bulky alkyl-, aryl-, and substituted arylsiloxane-modified silicon surfaces. The curves are exponential fits.

Image of FIG. 2.
FIG. 2.

(a) Calculated exposure dose vs position aerial image of our 157 nm interference exposure system for three average exposure doses. (b) Calculated through conversion of exposure dose from (a) into vs position.

Image of FIG. 3.
FIG. 3.

Polar surface energy aerial images for an exposed -butylsiloxane-modified silicon surface (top). Corresponding SEMs of annealed PS--PMMA films on patterned -butylsiloxane-modified silicon surfaces at the indicated exposure dose (bottom).

Image of FIG. 4.
FIG. 4.

(a) Polar surface energy slope vs exposure dose and (b) average surface energy difference vs exposure dose for exposed -butylsiloxane-modifed silicon surfaces showing exposure doses that directed the assembly of defect-free PS--PMMA (●), exposure doses that resulted in PS--PMMA films with defects (○), and exposure doses that did not result in perpendicular, directed PS--PMMA assembly (×).

Image of FIG. 5.
FIG. 5.

Average polar surface energy (defined over a 22 nm wide window centered at 45 nm, ) vs average polar surface energy (defined over a 22 nm wide window centered at 0 nm, ) for -butyl-(●,○), hexyl-(◆,◇), and octylsiloxane (▲,△) modified silicon surfaces showing surface energy combinations that resulted in defect-free assembly of annealed PS--PMMA films (filled symbols) and those with moderate defects (open symbols).

Image of FIG. 6.
FIG. 6.

Polar surface energy vs 193 nm exposure dose for a variety of alkyl- and arylsiloxane-modified silicon surfaces. The curves are exponential fits.

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/content/avs/journal/jvstb/27/6/10.1116/1.3250200
2009-12-04
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Lithographically directed surface modification
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3250200
10.1116/1.3250200
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