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Transparent hybrid polymer stamp copies with sub-50-nm resolution for thermal and UV-nanoimprint lithography
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10.1116/1.3250207
/content/avs/journal/jvstb/27/6/10.1116/1.3250207
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3250207

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Process route for fabrication of hybrid daughter stamps and replication in thermoplastic material: [(a)–(c)] Fabrication of first generation daughter stamp from silicon master (zeroth generation), (d) optional copying of second generation daughter stamp, [(e)–(h)] combined thermal and UV-NIL in spin coated resist.

Image of FIG. 2.
FIG. 2.

Scanning electron microscopy micrographs from cross sections of RIE etched master stamp with 47 nm depth, period of 76 nm, linewidth of 20 nm, and HSQ resist left after etching (initial thickness 60 nm).

Image of FIG. 3.
FIG. 3.

Imprints of 35 nm half-pitch structures into different thermoplastic resists: structures in mr-NIL 6000.3 (top) are well replicated, in mr-I 7030 (center) they are slightly rounded, and in mr-I 8030 (bottom) they are poorly replicated.

Image of FIG. 4.
FIG. 4.

Imprints of 100 nm diameter pillars into different thermoplastic resists: Structures in mr-NIL 6000.3 (top) are well replicated, in mr-I 8030 (bottom) only a part of the pillars are present (because they are either ripped away or the stamp were already filled from previous ripping).

Tables

Generic image for table
TABLE I.

Comparison of different thermoplastic materials replicated with Ormostamp molds.

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/content/avs/journal/jvstb/27/6/10.1116/1.3250207
2009-12-03
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Transparent hybrid polymer stamp copies with sub-50-nm resolution for thermal and UV-nanoimprint lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3250207
10.1116/1.3250207
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