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HBr based inductively coupled plasma etching of high aspect ratio nanoscale trenches in InP: Considerations for photonic applications
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10.1116/1.3250263
/content/avs/journal/jvstb/27/6/10.1116/1.3250263
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3250263
/content/avs/journal/jvstb/27/6/10.1116/1.3250263
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/content/avs/journal/jvstb/27/6/10.1116/1.3250263
2009-10-30
2014-11-27
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: HBr based inductively coupled plasma etching of high aspect ratio nanoscale trenches in InP: Considerations for photonic applications
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3250263
10.1116/1.3250263
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