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Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmas
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10.1116/1.3253532
/content/avs/journal/jvstb/27/6/10.1116/1.3253532
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3253532
/content/avs/journal/jvstb/27/6/10.1116/1.3253532
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/content/avs/journal/jvstb/27/6/10.1116/1.3253532
2009-11-05
2014-08-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmas
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3253532
10.1116/1.3253532
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