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Direct e-beam writing of thin carbon nanoribbons
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View: Figures


Image of FIG. 1.
FIG. 1.

(Color online) (a) Schematic representation of the fabrication of nanosheets and their transfer onto arbitrary substrates. A self-assembled monolayer of BPT is cross-linked by electron irradiation (1). The resulting nanosheet can be released from the substrate (2) and transferred to solid substrates (3) or over the openings of a grid (4). (b) Optical micrograph of a large piece of nanosheet transferred onto a Si wafer containing a thick layer of native . (c) Nanosheet spanned over the openings of a TEM grid. (d) AFM image of the edges of a transferred nanosheet, the corresponding line scan shows a sheet thickness of .

Image of FIG. 2.
FIG. 2.

(Color online) XPS analysis of the formation and pyrolysis at of the nanosheet on (a) Au and after transfer to (b) . The cross-linking of the monolayer is shown schematically in (c).

Image of FIG. 3.
FIG. 3.

(Color online) Room temperature nanosheet conductivity as a function of the annealing temperature in UHV. [(a)–(c)] Linear current-voltage characteristics for different annealing temperatures. (d) Summary of the conductivity for different annealing temperatures. The inset is a photograph of the experimental four-point measurement setup.

Image of FIG. 4.
FIG. 4.

(Color online) (a) SEM image of carbon nanosheet patterns formed by thermal desorption lithography. (b) Lines and spaces of can be resolved at a dose of .


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Direct e-beam writing of 1nm thin carbon nanoribbons