Curing process of silsesquioxane in self-organized diblock copolymer template
(Color online) Self-organized component consisting of PS-PEO and SSQ.
(Color online) SEM images of self-organized PS-PEO-S pattern transferred to Si substrate. (a) Thermally treated, (b) exposed plasma, and (c) schematic image of sample preparation process. Scale . Material: PS-PEO: Mn: 27 500, PS: 9500, PEO: 18 000 volume ratio .
Hole size analysis of top-down SEM images. [(a) and (c)] thermally treated, [(b) and (c)] exposed plasma, [(a) and (b)] hole size and [(c) and (d)] pitch size.
(Color online) GISAX analysis of the PS-PEO-S film before post-treatment. (nm): peak , , , , . Material: PS-PEO: Mn: 10 300 PS: 3800 PEO: 6500, volume ratio .
(Color online) Cross-sectional TEM images of self-organized PS-PEO-S pattern after post-treatment. Initial , (a) thermally treated, (b) exposed to oxygen plasma, , Scale . (c) Schematic image of sample preparation process. Material: PS-PEO: Mn: 10 300, PS: 3800 PEO: 6500, volume ratio .
(Color online) Pitch size analysis of cross-sectional TEM images. (a) Horizontal pitch and (b) vertical pitch.
(Color online) Hole size analysis of cross-sectional TEM images. (a) Horizontal diameter and (b) vertical diameter.
(Color online) Relationship between SSQ volume in the film and residual thickness after oxidation treatment, comparing thermal treatment and plasma treatment. Broken lines indicate the estimated residual thickness of SSQ from the results of treatment of 100% SSQ films. Data point in the circle shows 0.82 volume ratio.
TG curves of PS, PEO, and PS-PEO. Each polymer was measured from room temperature to .
(Color online) Schematic images of post-treatment processes. Baking: Polymer was removed after SSQ became rigid. The blanks of PEO remained. Plasma: Polymer was removed while SSQ was soft. SSQ shrank, and the small blanks of PEO disappeared.
(Color online) Application of the self-organized SSQ pattern as etching mask. (a) AFM image after oxygen plasma treatment. (b) Cross-sectional TEM image after oxygen plasma treatment. (c) AFM image after etching by gas. (d) Cross-sectional TEM image after etching by gas.
Shrinkage behaviors in the films; volume ratio Volume of PS phase and PEO phase was calculated form average of pitch and PS pore size.
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