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Curing process of silsesquioxane in self-organized diblock copolymer template
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10.1116/1.3256232
/content/avs/journal/jvstb/27/6/10.1116/1.3256232
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3256232

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Self-organized component consisting of PS-PEO and SSQ.

Image of FIG. 2.
FIG. 2.

(Color online) SEM images of self-organized PS-PEO-S pattern transferred to Si substrate. (a) Thermally treated, (b) exposed plasma, and (c) schematic image of sample preparation process. Scale . Material: PS-PEO: Mn: 27 500, PS: 9500, PEO: 18 000 volume ratio .

Image of FIG. 3.
FIG. 3.

Hole size analysis of top-down SEM images. [(a) and (c)] thermally treated, [(b) and (c)] exposed plasma, [(a) and (b)] hole size and [(c) and (d)] pitch size.

Image of FIG. 4.
FIG. 4.

(Color online) GISAX analysis of the PS-PEO-S film before post-treatment. (nm): peak , , , , . Material: PS-PEO: Mn: 10 300 PS: 3800 PEO: 6500, volume ratio .

Image of FIG. 5.
FIG. 5.

(Color online) Cross-sectional TEM images of self-organized PS-PEO-S pattern after post-treatment. Initial , (a) thermally treated, (b) exposed to oxygen plasma, , Scale . (c) Schematic image of sample preparation process. Material: PS-PEO: Mn: 10 300, PS: 3800 PEO: 6500, volume ratio .

Image of FIG. 6.
FIG. 6.

(Color online) Pitch size analysis of cross-sectional TEM images. (a) Horizontal pitch and (b) vertical pitch.

Image of FIG. 7.
FIG. 7.

(Color online) Hole size analysis of cross-sectional TEM images. (a) Horizontal diameter and (b) vertical diameter.

Image of FIG. 8.
FIG. 8.

(Color online) Relationship between SSQ volume in the film and residual thickness after oxidation treatment, comparing thermal treatment and plasma treatment. Broken lines indicate the estimated residual thickness of SSQ from the results of treatment of 100% SSQ films. Data point in the circle shows 0.82 volume ratio.

Image of FIG. 9.
FIG. 9.

TG curves of PS, PEO, and PS-PEO. Each polymer was measured from room temperature to .

Image of FIG. 10.
FIG. 10.

(Color online) Schematic images of post-treatment processes. Baking: Polymer was removed after SSQ became rigid. The blanks of PEO remained. Plasma: Polymer was removed while SSQ was soft. SSQ shrank, and the small blanks of PEO disappeared.

Image of FIG. 11.
FIG. 11.

(Color online) Application of the self-organized SSQ pattern as etching mask. (a) AFM image after oxygen plasma treatment. (b) Cross-sectional TEM image after oxygen plasma treatment. (c) AFM image after etching by gas. (d) Cross-sectional TEM image after etching by gas.

Tables

Generic image for table
TABLE I.

Shrinkage behaviors in the films; volume ratio Volume of PS phase and PEO phase was calculated form average of pitch and PS pore size.

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/content/avs/journal/jvstb/27/6/10.1116/1.3256232
2009-12-04
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Curing process of silsesquioxane in self-organized diblock copolymer template
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3256232
10.1116/1.3256232
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