1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Nanoimprint planarization of high aspect ratio nanostructures using inorganic and organic resist materials
Rent:
Rent this article for
USD
10.1116/1.3256658
/content/avs/journal/jvstb/27/6/10.1116/1.3256658
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3256658
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Schematic of sol-gel nanoimprint planarization process. (b) Schematic of uv-curable nanoimprint planarization process.

Image of FIG. 2.
FIG. 2.

FIB-cut cross-sectional SEM images of MTEOS sol-gel coated two-dimensional silicon photonic crystals (a) without pressing, (b) after pressing pressure of , (c) after pressing pressure of , and (d) zoom-in of (c).

Image of FIG. 3.
FIG. 3.

Tapping-mode AFM image of planarized surface on sample shown in Fig. 2(c). The rms roughness is . Shown at the bottom is a line surface profile taken across the dotted line on the AFM image.

Image of FIG. 4.
FIG. 4.

(a). FIB-cut cross-sectional SEM image of MTEOS sol-gel planarized two-dimensional silicon photonic crystals with thick overlayer obtained by concentrated sol-gel solution, (b) Zoom-in of (a).

Image of FIG. 5.
FIG. 5.

FIB-cut cross-sectional SEM images of (a) preplanarized silicon gratings with aspect ratio of 10; (b) MTEOS sol-gel planarized silicon gratings after pressing pressure of .

Image of FIG. 6.
FIG. 6.

FIB-cut cross-sectional SEM images of uv-curable nanoimprint resist planarized two-dimensional silicon photonic crystals with dispensed resist volumes of (a) and (b) .

Image of FIG. 7.
FIG. 7.

FIB-cut cross-sectional SEM images of uv-curable nanoimprint resist planarized two-dimensional silicon photonic crystals with dispensed resist volume of .

Loading

Article metrics loading...

/content/avs/journal/jvstb/27/6/10.1116/1.3256658
2009-12-03
2014-04-18
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nanoimprint planarization of high aspect ratio nanostructures using inorganic and organic resist materials
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3256658
10.1116/1.3256658
SEARCH_EXPAND_ITEM