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Stitching periodic submicron fringes by utilizing step-and-align interference lithography
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10.1116/1.3258152
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    Affiliations:
    1 Department of Electrical Engineering and Graduate Institute of Photonics and Optoelectronics, Photonics and Nano-Structure Laboratory, National Taiwan University, Taipei, Taiwan 10617, Republic of China
    2 Department of Mechanical Engineering, Precision System Control Laboratory, National Taiwan University, Taipei, Taiwan 10617, Republic of China
    3 Department of Electrical Engineering and Graduate Institute of Photonics and Optoelectronics, Photonics and Nano-Structure Laboratory, National Taiwan University, Taipei, Taiwan 10617, Republic of China
    4 Department of Mechanical Engineering, Precision System Control Laboratory, National Taiwan University, Taipei, Taiwan 10617, Republic of China
    5 Department of Electrical Engineering and Graduate Institute of Photonics and Optoelectronics, Photonics and Nano-Structure Laboratory, National Taiwan University, Taipei, Taiwan 10617, Republic of China
    6 Department of Mechanical Engineering, Precision System Control Laboratory, National Taiwan University, Taipei, Taiwan 10617, Republic of China
    7 Department of Electrical Engineering and Graduate Institute of Photonics and Optoelectronics, Photonics and Nano-Structure Laboratory, National Taiwan University, Taipei, Taiwan 10617, Republic of China
    a) Electronic mail: lon@ntu.edu.tw
    J. Vac. Sci. Technol. B 27, 2951 (2009); http://dx.doi.org/10.1116/1.3258152
/content/avs/journal/jvstb/27/6/10.1116/1.3258152
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3258152
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Schematic diagram of the SAIL. (a) Top view and the optical path on the optical table. (b) Front-view and the optical path on the vertical optical bench.

Image of FIG. 2.
FIG. 2.

(Color online) Top view diagram of the two-dimensional precision dual-actuator motion stages and the three-axis displacement interferometers.

Image of FIG. 3.
FIG. 3.

(Color online) Control architecture of nanopositioning stage.

Image of FIG. 4.
FIG. 4.

(Color online) (a) Designed stitch route map (i) and optimal intensity distribution of unit beam [(ii)–(iv)]; details are described in the text. (b) Uniform intensity distribution if the stitching has no misalignment. (c) The intensity would be lower at the overlapping areas with misalignment for the larger step size. (d) The intensity would be higher at the overlapping areas with misalignment for the smaller step size.

Image of FIG. 5.
FIG. 5.

(Color online) Schematic diagram showing a metal mask used to extract the central flat-top area of the Gaussian beam to simulate the uniform intensity beam.

Image of FIG. 6.
FIG. 6.

(Color online) Photographs of different fringe stitching results. (a) Correction test sample. (b) Vertical stitch. (c) Transverse stitch. (d) Pattern stitching over a full wafer along the designed route.

Image of FIG. 7.
FIG. 7.

(Color online) Micrographs of the stitching areas by OM and SEM.

Image of FIG. 8.
FIG. 8.

Side-view SEM images of (a) PR patterns, and transferred to Si wafer with different areas, (b) single exposure, (c) single exposure plus dc zone dosage, and (d) double exposure.

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/content/avs/journal/jvstb/27/6/10.1116/1.3258152
2009-12-03
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Stitching periodic submicron fringes by utilizing step-and-align interference lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3258152
10.1116/1.3258152
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