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High rate gas dosing for tip based nanofabrication processes
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10.1116/1.3259955
/content/avs/journal/jvstb/27/6/10.1116/1.3259955
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3259955

Figures

Image of FIG. 1.
FIG. 1.

Schematic of a tubular gas doser showing key dimensions.

Image of FIG. 2.
FIG. 2.

(Color) Gas flux from a simple orifice-type doser (, ).

Image of FIG. 3.
FIG. 3.

Axial velocity (a) and temperature (b) profiles from a simple orifice-type doser (, ).

Image of FIG. 4.
FIG. 4.

(Color) Scaled flux distributions from (a) dosers operated at small , where the curve colors indicate various combinations of design, , flowrate, , and values (analytical and DSMC results for an effusive emitter also shown); (b) capillary-type dosers for a range of values.

Image of FIG. 5.
FIG. 5.

Gas flux distributions from microcapillary arrays for small (a) and large (b) distance to diameter ratios.

Image of FIG. 6.
FIG. 6.

Features of advanced gas doser designs; (a) a curved MCA that focuses the flux from many capillaries and (b) an arrangement of nine small MCAs individually aimed at the target.

Image of FIG. 7.
FIG. 7.

Scaled gas flux from a single capillary compared to that from a small MCA (, , ).

Image of FIG. 8.
FIG. 8.

(Color) Gas flux distribution from a focused capillary-type doser (, ).

Image of FIG. 9.
FIG. 9.

Gas flux distributions over a wafer area from various gas dosers with (a) 45° approach angle and distance access constraints; (b) an orifice doser with , (c) nine flat MCAs with , a focused MCA with 26523 capillaries, and .

Tables

Generic image for table
TABLE I.

Experimental results for the dose required to saturate a silicon surface using disilane.

Generic image for table
TABLE II.

Comparison of the flow rate required to give a flux of from various dosers and the resulting chamber pressure assuming a pump speed of .

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/content/avs/journal/jvstb/27/6/10.1116/1.3259955
2009-12-02
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High rate gas dosing for tip based nanofabrication processes
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/27/6/10.1116/1.3259955
10.1116/1.3259955
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