Hybrid film nanoimprinting process. (a) Spinning hybrid film solution on silicon wafer. (b) Thermal imprinting mold on hybrid film. (c) UV irradiation. (d) Mold release. (e) plasma film treatment. (f) Final nanoimprinted features.
Nanoimprinting hybrid film. (A) wide lines that are in pitch are observed on the NIL mold. (B) These nano features are replicated into a sample coated with the hybrid film.
Hybrid film EDX analysis after spin coating onto the substrate.
Hybrid film thermal stability with directly imprinted samples (blue) and after UV and oxygen plasma treatment (red). All data points represent sample measurements.
Data showing the thickness of the film in control untreated samples and after UV and plasma etching treatment.
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