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Fabrication of large area ultrathin silicon membrane: Application for high efficiency extreme ultraviolet diffraction gratingsa)
a)This paper was presented at the 53rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Conference held in Marco Island, FL, 26–29 May 2009.
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10.1116/1.3290746
/content/avs/journal/jvstb/28/1/10.1116/1.3290746
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/1/10.1116/1.3290746
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) (a) Picture of the wafer with Si membrane of thick. (b) Si membrane profile obtained by interferometer microscopy showing flatness better than .

Image of FIG. 2.
FIG. 2.

(Color online) (a) Schematic of the Mo grating with the silica zero order absorber and scanning electron microscopy picture of the pitch Mo grating. (b) Optical microscope picture showing the membrane with dual grating for four different pitches and the zero order absorber all around.

Image of FIG. 3.
FIG. 3.

(Color online) PMMA contrast curve measured at photon energy through Si membrane thick.

Image of FIG. 4.
FIG. 4.

(Color online) Far field diffraction pattern from a single Mo grating. EUV intensity distribution transmitted and positive tone resist profile from which diffraction efficiency is measured.

Image of FIG. 5.
FIG. 5.

(Color online) First order diffraction efficiency of the Mo grating evaluated from PMMA ratio thicknesses between first order patterns printed and EUV background printed out of grating. The average first order efficiency is evaluated as 27%.

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/content/avs/journal/jvstb/28/1/10.1116/1.3290746
2010-01-28
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of large area ultrathin silicon membrane: Application for high efficiency extreme ultraviolet diffraction gratingsa)
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/1/10.1116/1.3290746
10.1116/1.3290746
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