Fabrication of large area ultrathin silicon membrane: Application for high efficiency extreme ultraviolet diffraction gratingsa)
(Color online) (a) Picture of the wafer with Si membrane of thick. (b) Si membrane profile obtained by interferometer microscopy showing flatness better than .
(Color online) (a) Schematic of the Mo grating with the silica zero order absorber and scanning electron microscopy picture of the pitch Mo grating. (b) Optical microscope picture showing the membrane with dual grating for four different pitches and the zero order absorber all around.
(Color online) PMMA contrast curve measured at photon energy through Si membrane thick.
(Color online) Far field diffraction pattern from a single Mo grating. EUV intensity distribution transmitted and positive tone resist profile from which diffraction efficiency is measured.
(Color online) First order diffraction efficiency of the Mo grating evaluated from PMMA ratio thicknesses between first order patterns printed and EUV background printed out of grating. The average first order efficiency is evaluated as 27%.
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