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Ultrahigh selective etching of films over films for silicon nitride gate spacer etching
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10.1116/1.3290752
/content/avs/journal/jvstb/28/1/10.1116/1.3290752
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/1/10.1116/1.3290752
/content/avs/journal/jvstb/28/1/10.1116/1.3290752
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/content/avs/journal/jvstb/28/1/10.1116/1.3290752
2010-01-13
2014-08-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ultrahigh selective etching of Si3N4 films over SiO2 films for silicon nitride gate spacer etching
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/1/10.1116/1.3290752
10.1116/1.3290752
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